한국기초과학지원연구원 전자현미경연구부
FIB(Focused Ion Beam) 장비 도입 안내

한국기초과학지원연구원 전자현미경연구부에서는 신규장비 FIB(Focused Ion Beam)을 도입하였습니다. 기기이용자분들의 많은 이용 바랍니다.

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1. 장비명 : Focused Ion Beam(FIB)
2. 모델명 : Quanta 3D FEG
3. 제조사 : FEI company
4. 장비사양
ㅇ Electron Optics
  - High-resolution field emission -SEM column optimized for high-brightness/high-current
  - Accelerating voltage : 200V - 30kV
ㅇ Electron beam resolution
 
High-vacuum Low-vacuum Extended low-vacuum mode(ESEM)
0.8nm at 30kV (STEM)
1.2nm at 30kV (SE)
2.5nm at 30kV (BSE)
2.9nm at 1kV (SE)		 1.5nm at 30kV (SE)
2.5nm at 30kV (BSE)
2.9nm at 3kV (SE)		 1.5 nm at 30kV (SE)
ㅇ Ion optic
  - High-current ion column with Ga liquid-
  - Accelerating voltage : 2kV - 30kV
  - Probe current : 1pA - 65nA in 15steps
ㅇ Ion beam resolution
  - 7 nm at 30kV
ㅇ Stage
  - X = 50 mm * Y = 50mm * Z = 25mm
  - Maximum sample height = 50mm
  - T = -15° to 75°
ㅇ Accessories
  - EDS
  - GIS : Pt
  - Auto-FIB functionality for multi-site sample preparation
  - Auto-Slice and View automation software
  - cooling stage

5. Applications
ㅇ Defect Characterization
  - Slice and View
  - EDX
  - TEM Sample Preparation and take STEM image
  - Gas Enhanced Deposition and Etch